Thin layers
The CNF’s thin-film deposition equipment consists of:
— 1 thermal evaporation unit (ME300, Plassys)
— 2 e-beam evaporation units, one with ion assistance and a thermal source (MEB400, Plassys and Elettrorava)
— 2 sputtering units, one with a thermal evaporation source (MP300 and MEP300, Plassys)
— 1 plasma-assisted CVD unit with inductive coupling (Plasmapro100 Cobra ICPCVD, Oxford Instruments)
Lithographs and engravings
The CNF has a 45 m² cleanroom equipped for the deposition and structuring of lithography resins:
– Spin coaters, hot plates
– 2 fume hoods for deposition, chemical etching, and ultrasonic cleaning
– 1 UV lithography mask aligner (MJB4, Süss MicroTec)
– 1 electron nanomasker (Pioneer, Raith)
– 1 metallizer (Edwards), 1 plasma cleaner (Harrick)
As well as for surface preparation and thin-film etching:
– 1 RIE etching system with inductive coupling (Plasmalab System100 RIE-ICP, Oxford Instruments)
– An ion milling machine (MU400, Plassys) located in an adjacent room completes the equipment list for this facility.
Nanofab Characterizations
The fabrications are often accompanied by characterizations (composition, structure, physical properties) which can be carried out by the CNF itself or by other components of the platform (see CNMC center).
The specific characterization tools for the control and validation of nanofabrication processes are managed by CNF members and located in the immediate vicinity of the equipment:
– 1 reflection spectrometer for checking the thickness of resins, deposits, and etchings
– 1 SEM (JSM-6500F, JEOL) for checking surfaces and structures (dimensional characteristics of structures, surface finish)
– 1 AFM for measuring roughness and the dimensional characteristics of structures
– 1 high-magnification optical microscope with camera for routine observations
– 1 spectroscopic ellipsometer for estimating the optical index of the layers
